플라즈마 중합법에 의한 헥사메틸디실록산 박막의 전기적 특성

Title
플라즈마 중합법에 의한 헥사메틸디실록산 박막의 전기적 특성
Other Titles
Electrical Properties of Plasma Polymerized Hexamethyidisitoxane Thin Film
Authors
이덕출
Keywords
plasma polymerization, hexamethyldisiloxane, relative dielectric constant dielectric loss tangent, Schottky effect
Issue Date
2001
Publisher
한국전기전자재료학회
Series/Report no.
Journal of KIEEME; Vol.14 No.1
URI
http://uci.or.kr/I410-ECN-0102-2009-560-006545214
http://dspace.inha.ac.kr/handle/10505/29672
ISSN
1226-7945
Appears in Collections:
College of Engineering(공과대학) > Electrical Engineering (전기공학) > Local Access Journal, Report (전기공학 논문, 보고서)

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