Formation and Applications of Complex Nanopatterns from Block Copolymer Self-Assembly

Formation and Applications of Complex Nanopatterns from Block Copolymer Self-Assembly
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Self-assembly of block copolymer in thin films is simple and cost-effective method for manufacturing well-ordered and well-aligned structures that can be used as template for secondary inorganic compound, which has the electronic, magnetic, photonic or biosensing properties, patterns. However, block copolymer self-assembly on an unpatterned substrate creates only simple and repeated structures that are pre-determined by block copolymer characteristics, such as block composition and molecular weight. In this work, simple route to create complex metallic patterns by mixing of different solutions without pre-patterns of substrate was offered. For the purpose, types of block copolymer PS-b-P2VP and PS-b-P4VP were dissolved in good-solvent and selective-solvent, respectively and then mixed in one solution. Surface morphology in thin film, which is fabricated by spin-coating of mixed solution, exhibits various patterns of mixture of lines and dots through solvent annealing. Such patterns are
요약 1 1. Introduction 3 2. Experimentals 6 2.1. Materials 6 2.2. Film preparation 6 2.3. characterization 7 2.4 Characterization 7 2.4.1 Atomic force microscopy (AFM) 7 2.4.2 Transmission electron microscopy (TEM) 7 2.4.3 Scanning electron microscopy (SEM) 8 3. Results and Discussion 9 3.1 Morphology of the block copolymer cylinders 9 3.2 Effect of acidic condition 11 3.3 Metallic nanowires 13 3.4 Fabrication of various alkanethiol patterns 15 3.5 Fabrication of complex patterns 20 4. Conclusion 27 5. Reference 28
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College of Engineering(공과대학) > Applied Organic Materials Engineering (유기응용재료공학) > Theses(유기응용재료공학 석박사 학위논문)
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