Reaction of gas-phase bromine atom with chemisorbed hydrogen atoms on a silicon(100)-(2x1) surface

Title
Reaction of gas-phase bromine atom with chemisorbed hydrogen atoms on a silicon(100)-(2x1) surface
Authors
Kim, Y.H.
Keywords
bromine, hydrogen, silicon
Issue Date
2001-08
Publisher
BULLETIN OF THE KOREAN CHEMICAL SOCIETY
Abstract
The reaction of gas-phase atomic bromine with highly covered chemisorbed hydrogen atoms on a silicon surface is studied by use of the classical trajectory approach. It is found that the major reaction is the formation of HBr(g), and it proceeds through. two modes, that is, direct Eley-Rideal and hot-atom mechanism. The HBr formation reaction takes place on a picosecond time scale with most of the reaction exothermicity depositing in the product vibration and translation. The adsorption of Br(g) on the surface is the second most efficient reaction pathway. The total reaction cross sections are 2.53 Angstrom (2) for the HBr formation and 2.32 Angstrom (2) for the adsorption of Br(g) at gas temperature 1500 K and surface temperature 300 K.
URI
http://dspace.inha.ac.kr/handle/10505/20187
ISSN
0253-2964
Appears in Collections:
College of Natural Science(자연과학대학) > Chemistry (화학) > Journal Papers, Reports(화학 논문, 보고서)
Files in This Item:
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