Remote Plasma 및 UV/O3를 이용한 Si-wafer 및 RuO2-MOCVD/TiN의 건식세정 =

Title
Remote Plasma 및 UV/O3를 이용한 Si-wafer 및 RuO2-MOCVD/TiN의 건식세정 =
Authors
崔均碩
Issue Date
2003
Publisher
인하대학교
URI
http://dspace.inha.ac.kr/handle/10505/11728
Appears in Collections:
College of Engineering(공과대학) > Materials Science & Engineering (신소재공학) > Theses(신소재공학 석박사 학위논문)
Files in This Item:
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