Consecutive CVD of Al/Co Bilayers on SiO2 or Alq(3) surfaces at low temperature of 70 degrees C

Title
Consecutive CVD of Al/Co Bilayers on SiO2 or Alq(3) surfaces at low temperature of 70 degrees C
Authors
Lee, C.M.
Keywords
TRANSITION-METAL-COMPLEXES, OPTICAL-PROPERTIES
Issue Date
2007-07
Publisher
ELECTROCHEMICAL SOC INC
Abstract
A low-voltage (< 2 V, three-electrode system) method for the cathodic electrodeposition of fullerol [polyhydroxylated fullerene, C-60 (OH)(n)] from an aqueous solution has been developed for the synthesis of thin films. Scanning electron microscopy of the electrodeposited fullerol films shows that the films are microscopically uniform; the film thickness was observed to vary linearly with the deposition charge. X-ray photoelectron spectroscopy of the C 1s peak indicates that the carbon constituents of the electrodeposited films are electronically similar to the fullerol precursor. Infrared spectroscopy (IRS) confirmed that the fullerol moiety is intact upon electrodeposition and that the films are thermally stable up to 150 S C. At higher temperatures IRS data suggest there is cleavage of a ketal or hemiketal group followed by hydroxyl group cleavage. The (direct) optical bandgap obtained from UV-visible spectroscopy of the electrodeposited film was 2.6 eV.
URI
http://dspace.inha.ac.kr/handle/10505/1567
ISSN
0013-4651
Appears in Collections:
College of Engineering(공과대학) > Materials Science & Engineering (신소재공학) > Journal Papers, Reports(신소재공학 논문, 보고서)
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